Comparison between pulse and CW laser cleaning machines

一、Comparison of parameters between pulsed laser and CW laser


Pulse laser (for cleaning)

CW laser

Average Power

Hundred-watts class(100-500W)

Kilowatt class(1000-3000W)

Peak Power

10K-watts class(10-40KW)

Kilowatt class(1000-3000W)

Lighting Method

Pulse light (nanosecond pulses): Pulse width: 50-500ns

Continuous and pulsed light (millisecond pulses)




Bean Quality

Flat top light (even energy)

Gaussian light (strong energy center)

Single Pulse Energy




二、Comparison of parameters between pulsed and CW cleaning machine 

1、Cleaning Comparison





Cleaning Efficiency



The average power of CW laser and single pulse energy are large, and the cleaning efficiency is higher.

Cleaning Effect



The pulsed laser energy is evenly distributed without damaging the substrate; the pulse width is small, the frequency is high, and the shading is more delicate.

Heat Impact



The pulsed laser has high peak power, instantly vaporizes impurities, with small pulse width and small heat input to the substrate。

Equipment Cost



CW lasers are cheaper and equipment costs are lower

Applicable Industries

molds, fine parts

pipes, rough parts


Cleaning Material

rubber impurities, thin rust layer

thick rust or paint layer


2.Applicable Industry Comparison

1) Pulse laser cleaning machine:


2) CW laser cleaning machine



1. The pulse laser cleaning machine can better control the heat input and prevent the substrate temperature from being too high or micro-melting. It is suitable for application scenarios with high precision, which need to strictly control the heating of the substrate and require the substrate to be non-destructive, such as the mold industry;

2. The CW laser cleaning machine has a price advantage, the average laser power is higher, as well as the cleaning efficiency. However, the heat input of high-power CW lasers is greater, and the degree of damage to the substrate will also increase. For some large steel structures, pipes, etc., due to the large volume and fast heat dissipation, the requirements for substrate damage are not high, and CW laser cleaning machines can be selected.

Post time: Mar-17-2022